Mask induced polarization effects at high NA

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dc.contributor.author Estroff, Andrew
dc.contributor.author Fan, Yongfa
dc.contributor.author Bourov, Anatoly
dc.contributor.author Smith, Bruce
dc.contributor.author Foubert, Philippe
dc.contributor.author Leunissen, L.
dc.contributor.author Philipsen, Vicky
dc.contributor.author Aksenov, Yuri
dc.date.accessioned 2009-07-29T15:45:58Z
dc.date.available 2009-07-29T15:45:58Z
dc.date.issued 2005
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XVIII, vol. 5754, pp. 555-566, 2005 en_US
dc.identifier.uri http://hdl.handle.net/1850/10343
dc.description.abstract It is important to understand how a photomask will polarize incident radiation. This paper presents data collected on binary mask and various attenuated phase shifting mask materials, feature sizes, duty ratios, and illumination schemes via rigorous coupled wave analysis, extinction spectroscopy, and 193nm lithographic evaluation. Additionally, the result of polarization effects due to the photomask on imaging has been studied. It was found that in the majority of the cases, higher NA led to greater polarization effects. All mask materials predominantly pass the TM polarization state for the 0 order, whereas different materials and duty ratios affect the polarization of the first diffracted orders differently. The polarization effects contributed by mask materials being considered for use in high NA imaging systems need to be examined. The degree of polarization as a function of n and k is presented, providing an introduction to the desirable properties of future mask materials. Materials with higher refractive indices and lower extinction coefficients tend to pass more of the TM polarization state, which is undesirable. Materials with lower indices and relatively wide range of extinction coefficients pass more TE polarized radiation. The duty ratio, critical dimension, mask material, material thickness, and illumination scheme all influence mask induced polarization effects. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation.ispartofseries vol. 5754 en_US
dc.subject High NA en_US
dc.subject Immersion lithography en_US
dc.subject Photomask en_US
dc.subject Polarization en_US
dc.subject Wire-grid polarizer en_US
dc.title Mask induced polarization effects at high NA en_US
dc.type Proceedings en_US

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