Evanescent wave imaging in optical lithograpy

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Title: Evanescent wave imaging in optical lithograpy
Author: Smith, Bruce; Fan, Yongfa; Zhou, Jianming; Lafferty, Neal; Estroff, Andrew
Abstract: New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist with a refractive index of 1.71. Additionally, a photomask enhancement effect is described using evanescent wave assist features (EWAF) to take advantage of the coupling of the evanescent energy bound at the substrate-absorber surface, enhancing the transmission of a mask opening through coupled interference.
Record URI: http://hdl.handle.net/1850/11385
Date: 2006

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