Immersion microlithography at 193 nm with a Talbot prism interferometer

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Title: Immersion microlithography at 193 nm with a Talbot prism interferometer
Author: Bourov, Anatoly; Fan, Yongfa; Cropanese, Frank; Lafferty, Neal; Zavyalova, Lena; Kang, Hoyoung; Smith, Bruce
Abstract: A Talbot interference immersion lithography system that uses a compact prism is presented. The use of a compact prism allows the formation of a fluid layer between the optics and the image plane, enhancing the resolution. The reduced dimensions of the system alleviate coherence requirements placed on the source, allowing the use of a compact ArF excimer laser. Photoresist patterns with a half-pitch of 45 nm were formed at an effective NA of 1.05. In addition, a variable-NA immersion interference system was used to achieve an effective NA of 1.25. The smallest half-pitch of the photoresist pattern produced with this system was 38 nm.
Record URI: http://hdl.handle.net/1850/11400
Date: 2004

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