OPC and image optimization using localized frequency analysis

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Title: OPC and image optimization using localized frequency analysis
Author: Smith, Bruce; Ewbank, Dale
Abstract: A method of assist feature OPC layout is introduced using a frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal intensity threshold requirements of an imaging process, a mask equalizing function can be designed. This provides the basis for frequency model-based assist feature layout. By choosing assist bar parameters that meet the requirements of the equalizing function, through-pitch focus and dose matching is possible for large two dimensional mask fields. The concepts introduced also lead to additional assist feature options and design flexibility .
Record URI: http://hdl.handle.net/1850/11406
Date: 2002-03

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