Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems

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dc.contributor.author Connors, James
dc.contributor.author Kos, Todd
dc.contributor.author Pack, Robert
dc.contributor.author Smith, Bruce
dc.date.accessioned 2010-02-03T22:06:49Z
dc.date.available 2010-02-03T22:06:49Z
dc.date.issued 1993-03-03
dc.identifier.citation Proceedings of the SPIE Conference on Optical/Laser Microlithography VI, vol. 1927, March 3, 1993 en_US
dc.identifier.uri http://hdl.handle.net/1850/11408
dc.description.abstract Industrial demands for integrated circuits of higher speed and complexity have required the development of advanced lithographic exposure tools capable of sub-half micron resolution over increasingly larger fields. To this end, i-line and deep-uv tools employing Variable, high numerical aperture (NA) objectives are being aggressively developed. The design and manufacture of these advanced optical systems has also grown in complexity, since tighter tolerances on resolution and image placement must be maintained over the larger lens field. At the same time, usable focus and exposure latitude must be retained. The influence of lens aberrations on image formation under different illumination conditions, along with their non-intuitive nature has required the development of simulation tools that allow both the designer and the user of these systems to better understand their implications. These tools can be used to investigate and optimize the lithography process, including the effects of emerging technologies such as phase-shift masking, oblique illumination and frequency plane filtering./super 1,2,3/ This paper presents a method for determining the effects and interactions of various aberrations and illumination conditions using a statistically designed experhnent./super 4/ Fundamental differences in the way the aerial image is formed when varying the pupil energy distribution in the presence of aberrations are presented, as are examples of some of the more interesting effects. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation.ispartofseries vol. 1927 en_US
dc.title Advanced lithography simulation tools for development and analysis of wide-field high NA projection optical systems en_US
dc.type Proceedings en_US

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