Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography

Show simple item record Zhou, Jianming Fan, Yongfa Smith, Bruce 2010-02-03T22:09:24Z 2010-02-03T22:09:24Z 2006-02-21
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XIX , vol. 6154, February 21, 2006 en_US
dc.description.abstract Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of three-dimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the UV spectrum is still considered to be a challenge. A systematic analysis of immersion lithography for 3-D photonic crystal fabrication will be provided in this paper. Significant progress has been made on optical immersion lithography since it was first proposed. Two-beam immersion interferometric lithography can provide sub-30nm resolution. By changing the exposure parameters, such as the numerical aperture of the exposure system, the polarization states and wavelength of the illumination source, 30 nm polymeric nanospheres with different crystal structures can be fabricated. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation RIT Scholars content from RIT Digital Media Library has moved from to RIT Scholar Works, please update your feeds & links!
dc.relation.ispartofseries vol. 6154 en_US
dc.subject Immersion lithography en_US
dc.subject Interferometric lithography en_US
dc.subject Photonic crystals en_US
dc.title Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography en_US
dc.type Proceedings en_US

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