ILSim – A Compact simulation tool for interferometric lithography

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dc.contributor.author Fan, Yongfa
dc.contributor.author Bourov, Anatoly
dc.contributor.author Zavyalova, Lena
dc.contributor.author Zhou, Jianming
dc.contributor.author Estroff, Andrew
dc.contributor.author Lafferty, Neal
dc.contributor.author Smith, Bruce
dc.date.accessioned 2010-02-03T22:10:06Z
dc.date.available 2010-02-03T22:10:06Z
dc.date.issued 2005
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XVIII, vol. 5754, pp.1805-1816 , 2005 en_US
dc.identifier.uri http://hdl.handle.net/1850/11420
dc.description.abstract Interference imaging systems are being used more extensively for R&D applications where NA manipulation, polarization control, relative beam attenuation, and other parameters are explored and projection imaging approaches may not exist. To facilitate interferometric lithography research, we have developed a compact simulation tool, ILSim, for studying multi-beam interferometric imaging, including fluid immersion lithography. The simulator is based on full-vector interference theory, which allows for application at extremely high NA values, such as those projected for use with immersion lithography. In this paper, ILSim is demonstrated for use with two-beam and four-beam interferometric immersion lithography. The simulation tool was written with Matlab, where the thin film assembly (ambient, top coat, resist layer, BARC layers, and substrate) and illumination conditions (wavelength, polarization state, interference angle, demodulation, NA) can be defined. The light intensity distributions within the resist film for 1 exposure or 2-pass exposure are displayed in the graph window. It also can optimize BARC layer thickness and top coat thickness. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation.ispartofseries vol. 5754 en_US
dc.subject Full vector imaging theory en_US
dc.subject High-NA en_US
dc.subject Interferometric lithography en_US
dc.subject Modeling en_US
dc.title ILSim – A Compact simulation tool for interferometric lithography en_US
dc.type Proceedings en_US

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