Comparison of immersion lithography from projection and interferometric exposure tools

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dc.contributor.author Robertson, Stewart
dc.contributor.author Leonard, Joanne
dc.contributor.author Smith, Bruce
dc.contributor.author Bourov, Anatoly
dc.date.accessioned 2010-02-03T22:11:05Z
dc.date.available 2010-02-03T22:11:05Z
dc.date.issued 2006
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XIX, vol. 6154, 2006 en_US
dc.identifier.uri http://hdl.handle.net/1850/11424
dc.description.abstract In this work, an Amphibian XIS interference mini-stepper is used to synthesize the aerial image of 90nm dense line/space pattern produced by an ASML TWINSCAN /1150i immersion scanner, using a second single beam exposure to demodulate the first 100% modulated interference exposure. The experimental data from the scanner and the demodulated interference exposure have near identical exposure latitude and LER (line edge roughness). Whilst the synthetic defocus data also shows a good degree of correlation with the projection data, the level of agreement is a little lower. Overall agreement is good, suggesting that the use of the synthetic aerial image approach is a useful screening tool for photoresists prior to testing on full field scanner system. This technique can be used to predict the performance of future projection tools, allowing cycles of learning in resist development prior to scanner availability. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation.ispartofseries vol. 6154 en_US
dc.subject Aerial image synthesis en_US
dc.subject Immersion lithography en_US
dc.subject Interference lithography en_US
dc.title Comparison of immersion lithography from projection and interferometric exposure tools en_US
dc.type Proceedings en_US

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