Comparison of immersion lithography from projection and interferometric exposure tools

Show simple item record Robertson, Stewart Leonard, Joanne Smith, Bruce Bourov, Anatoly 2010-02-03T22:11:05Z 2010-02-03T22:11:05Z 2006
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XIX, vol. 6154, 2006 en_US
dc.description.abstract In this work, an Amphibian XIS interference mini-stepper is used to synthesize the aerial image of 90nm dense line/space pattern produced by an ASML TWINSCAN /1150i immersion scanner, using a second single beam exposure to demodulate the first 100% modulated interference exposure. The experimental data from the scanner and the demodulated interference exposure have near identical exposure latitude and LER (line edge roughness). Whilst the synthetic defocus data also shows a good degree of correlation with the projection data, the level of agreement is a little lower. Overall agreement is good, suggesting that the use of the synthetic aerial image approach is a useful screening tool for photoresists prior to testing on full field scanner system. This technique can be used to predict the performance of future projection tools, allowing cycles of learning in resist development prior to scanner availability. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation RIT Scholars content from RIT Digital Media Library has moved from to RIT Scholar Works, please update your feeds & links!
dc.relation.ispartofseries vol. 6154 en_US
dc.subject Aerial image synthesis en_US
dc.subject Immersion lithography en_US
dc.subject Interference lithography en_US
dc.title Comparison of immersion lithography from projection and interferometric exposure tools en_US
dc.type Proceedings en_US

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