Effects of beam pointing instability on two-beam interferometric lithography

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dc.contributor.author Fan, Yongfa
dc.contributor.author Bourov, Anatoly
dc.contributor.author Slocum, Michael
dc.contributor.author Smith, Bruce
dc.date.accessioned 2010-02-03T22:13:00Z
dc.date.available 2010-02-03T22:13:00Z
dc.date.issued 2006
dc.identifier.citation Proceedings of the SPIE Conference on Optical Microlithography XIX, vol. 6154, 2006 en_US
dc.identifier.uri http://hdl.handle.net/1850/11429
dc.description.abstract In a photolithographic system, the mask patterns are imaged through a set of lenses on a resist-coated wafer. The image of mask patterns physically can be viewed as the interference of the plane waves of the diffraction spectrum captured by the lens set incident on the wafer plane at a spectrum of angles. Two-beam interference fringe is the simplest format of the image. Consequently, two-beam interferometric lithography is often employed for photolithographic researches. For two-beam interferometric lithography, beam pointing instability of the illumination source can induce fringe displacement, which results in a loss of fringe contrast if it happens during the exposure. Since some extent of beam pointing instability is not avoidable, it is necessary to investigate its effects on the contrast of the interference fringe. In this paper, the effects of beam pointing instability associated with a two beam interferometric lithography setup are analyzed. Using geometrical ray tracing technique and basic interference theory, the relationship between the beam tilt angle and interference fringe displacement is established. For a beam pointing instability with random distribution, the resulted fringe contrast is directly proportional to the Fourier transform of the pointing distribution evaluated at 1/2(pi). The effect of a pointing instability with normal distribution on interference contrast is numerically investigated. en_US
dc.language.iso en_US en_US
dc.publisher SPIE en_US
dc.relation.ispartofseries vol. 6154 en_US
dc.subject Interferometric lithography en_US
dc.subject Laser pointing instability en_US
dc.subject Vibration en_US
dc.title Effects of beam pointing instability on two-beam interferometric lithography en_US
dc.type Proceedings en_US

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