Zirconium pendent poly(amic acid) and polyimide based on 3,4'-ODA and ODPA

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dc.contributor.advisor Illingsworth, Marvin
dc.contributor.author Yang, Kanwen
dc.date.accessioned 2011-06-20T17:09:44Z
dc.date.available 2011-06-20T17:09:44Z
dc.date.issued 1999-05
dc.identifier.uri http://hdl.handle.net/1850/13735
dc.description.abstract To improve the materials' resistance to atomic oxygen, the aromatic polyamic acid based on 4,4'-oxydiphthalic anhydride (ODPA), 3,4'-oxydianiline (ODA) and mellitic dianhydride (MADA) was synthesized and allowed to react with the complex (4- amino-N,N ' -disalicylidene- 1 ,2-phenylenediaminato)(N,N ' -disalicylidene- 1 phenylenediaminato)zirconium (IV), Zr (adsp)(dsp), in the presence of dicyclohexylcarbodiimide (DCC). The resulting Zr pendent polyamide acid was cast onto glass substrates, and thermally imidized. The synthesized polyamic acids and polyimides were characterized by Thin Layer Chromatography (TLC), Fourier Transform Infrared (FTIR), Proton Nuclear Magnetic Resonance ('H NMR) and Gel Permeation Chromatography (GPC), along with Thermogravimetric Analysis (TGA) and Differential Scanning Calorimetry (DSC) for investigating their thermal properties. Spectroscopic results of Zr(adsp)(dsp), polyamic acids and polyimides were consistent with their proposed structures. GPC results indicate that a moderate degree of polymerization occurred. Decomposition temperatures of Zr pendent polymers, in air, are above 400 C, which are similar to previously made Zr pendent polymers. Two layer 10% mol Zr pendent polyimide films were also made. All the imidized films passed a solvent resistance test which involved immersion in acetone, toluene, 1- methyl-pyrrolidinone (NMP), chloroform and dimethysulfoxide (DMSO) for 30 minutes followed by fingernail crease. Their atomic oxygen resistance were studied by Scanning Electronic Microscopy (SEM) before and after atomic oxygen erosion in a plasma asher. Erosion of the Zr pendent polyimide film left a white surface residue, which was due primarily to zirconium oxide formation. The generation of a uniform zirconium oxide layer protects a preponderance of the original material. It is noticed from the SEM results that an improvement of atomic oxygen resistance was achieved from Zr pendent polyimide compared to its parent polymer. In comparison to LARC-IA, the Zr pendent polyimide has similar thermal stability, but with lower Tg and melting point, 171.8 and 236.5 C. en_US
dc.language.iso en_US en_US
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dc.subject Chemistry en_US
dc.subject.lcc QD381 .Y364 1999
dc.subject.lcsh Polymers en_US
dc.subject.lcsh Aromaticity (Chemistry) en_US
dc.subject.lcsh Zirconium oxide en_US
dc.title Zirconium pendent poly(amic acid) and polyimide based on 3,4'-ODA and ODPA en_US
dc.type Thesis en_US
dc.description.college College of Science en_US
dc.description.department Department of Chemistry en_US

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