Characterization of variable molecular weight and alternative solvent poly(methylmethacrylate) resist systems for electron beam lithography

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Title: Characterization of variable molecular weight and alternative solvent poly(methylmethacrylate) resist systems for electron beam lithography
Author: Eakin, Todd
Abstract: Poly(methylmethacrylate), PMMA, resist samples with varying weight average molecular weights and several non-chlorobenzene casting solvents were characterized utilizing. electron beam lithography. Environmental concerns with chlorobenzene have motivated investigation into alternative casting solvents for PMMA resists. Processing effects of variation in the molecular weight of the PMMA resin were unknown and have been quantified. Weight average molecular weights ranging from 539,000 g/mol to 614,000 g/mol were studied in chlorobenzene resist systems. Chlorobenzene, anisole, butyl-acetate, and propylene glycol monoethyl ether acetate solvents were studied in resist systems of constant weight average molecular weight. A three stage screening, optimization, and confirmation experiment was conducted to characterize the different experimental PMMA resist systems. Pre-bake temperature was the only processing input factor to be affected by solvent type. Weight average molecular weight had no statistically significant effect in performance of any resist sample. Measured performance outputs, patterned linewidth, did not significantly vary between the experimental samples. The solvents, chlorobenzene, anisole, and propylene glycol monoethyl ether acetate, and weight average molecular weights ranging from 539,000 g/mol to 614,000 g/mol gave equivalent performance in PMMA resist systems.
Record URI: http://hdl.handle.net/1850/13777
Date: 1997-01-01

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