Comparison between edge tracing and slit tracing in the measurement of the OTF

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dc.contributor.advisor Easton, R.
dc.contributor.advisor Lechner, H.
dc.contributor.author Perron, J. S. L.
dc.date.accessioned 2012-05-23T14:31:04Z
dc.date.available 2012-05-23T14:31:04Z
dc.date.issued 1988-05
dc.identifier.uri http://hdl.handle.net/1850/15037
dc.description.abstract A study was performed to compare two methods of measuring the Optical Transfer Function (OTF), namely edge tracing and slit tracing, to evaluate the performances and limitations of each method. Edge tracing is a very common method of measuring the OTF of an optical system. It is simple to set up, but the sampling size is limited and derivation of the Edge Spread Function is required in order to obtain the Line Spread Function (LSF). This derivation induces considerable high frequency noise. A competing method, slit tracing, is more complex mainly because of physical limitations such as the actual slit width. It has the advantages of directly providing the Line Spread Function (LSF), and having constant noise over all frequencies. Both methods gave equally good results at low noise levels, but Edge tracing was found to be advantageous at higher noise levels. en_US
dc.language.iso en_US en_US
dc.subject Edge tracing en_US
dc.subject Line spread function en_US
dc.subject LSF en_US
dc.subject Optical transfer function en_US
dc.subject OTF en_US
dc.subject Slit tracing en_US
dc.subject.lcc TA1632 .P475 1988
dc.subject.lcsh Optical transfer function--Measurement--Evaluation en_US
dc.subject.lcsh Optical measurements--Evaluation en_US
dc.subject.lcsh Image processing en_US
dc.title Comparison between edge tracing and slit tracing in the measurement of the OTF en_US
dc.type Thesis en_US
dc.description.college College of Science en_US
dc.description.department Chester F. Carlson Center for Imaging Science en_US
dc.contributor.advisorChair Granger, E.

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