Fabrication of jet printed interdigitated back contact solar cells

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dc.contributor.advisor Pearson, Robert
dc.contributor.author Alvarez-Camacho, Guadalupe
dc.date.accessioned 2012-10-23T18:43:49Z
dc.date.available 2012-10-23T18:43:49Z
dc.date.issued 2012-06-29
dc.identifier.uri http://hdl.handle.net/1850/15397
dc.description.abstract Interdigitated back contact solar cells were fabricated by a process in which patterned photoresist is jet printed directly on the wafer instead of by lithography. The patterned photoresist is used as a barrier for phosphorous and boron implantation as well as for contacts and metal etching. Control solar cells were fabricated by lithography in order to compare the performance of each patterning method. It was found that some of the jet printed photoresist films had non-uniformity issues with respect to the minimal thickness required for implant masking. When these thin zones are not present, structures obtained by jet printed are very similar to those obtained by lithography. With appropriate manufacturing development this technology has been shown to be feasible for lower-cost high volume production of solar cells. en_US
dc.language.iso en_US en_US
dc.subject Back contact solar cells en_US
dc.subject Jet printing en_US
dc.subject Photovoltaics en_US
dc.subject Semiconductor devices en_US
dc.subject Solar cells en_US
dc.subject Solar energy en_US
dc.subject.lcc TK2960 .A58 2012
dc.subject.lcsh Solar cells--Design and construction en_US
dc.subject.lcsh Photovoltaic cells--Design and construction en_US
dc.subject.lcsh Semiconductors--Design and construction en_US
dc.title Fabrication of jet printed interdigitated back contact solar cells en_US
dc.type Thesis en_US
dc.description.college Kate Gleason College of Engineering en_US
dc.description.department Department of Electrical and Microelectronic Engineering en_US

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