Surface composition and distribution of fluorine in plasma-fluorinated polyimide

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Title: Surface composition and distribution of fluorine in plasma-fluorinated polyimide
Author: Matienzo, L.; Emmi, F.; Egitto, F.; Van Hart, D.; Vukanovic, V.; Takacs, Gerald
Abstract: Surface composition, fluorine distribution, and morphology were determined for polyimide films modified downstream from microwave plasmas containing CF4/O2. Complementary analytical techniques including x-ray photoelectron spectroscopy, Rutherford backscattering spectroscopy, and scanning electron microscopy yielded a more complete understanding of polyimide fluorination and subsequent etching of the modified film. Depth of fluorination increased nonlinearly with treatment time for films exposed downstream from a CF4-rich plasma. Exposure downstream from an O2-rich plasma resulted in a reduction of thickness in both the fluorinated layer and the unmodified polyimide during etching. Finally, a model for fluorination of polyimide and subsequent removal is proposed.
Description: RIT community members may access full-text via RIT Libraries licensed databases: http://library.rit.edu/databases/
Record URI: http://hdl.handle.net/1850/2256
Publishers URL: http://dx.doi.org/10.1116/1.575037
Date: 1988-05

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