The evaluation of positive photoresist speed

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Title: The evaluation of positive photoresist speed
Author: Flagello, Donis
Abstract: The feasibility of photographic speed values for positive photoresist is evaluated. Speed is defined as the reciprocal of exposure necessary to produce a desired response. An outline of the microlithographic process, the chemistry of positive resist, and previous exposure models precede the experimental body of work to facilitate understanding of the photoresist system. The experimental method proposes a mathematical model describing the resist response to exposure. Photographic speed values result from this model. They are tested for sensitivity to process changes using Analysis of Variance. One speed definition is chosen as a possible standard and process control. It is based on the exposure required to produce a resist thickness of .4 microns above the under-lying substrate.
Record URI: http://hdl.handle.net/1850/8836
Date: 1981-05

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