The ability of surfactants to assist in the removal of image scum in positive resist development

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Title: The ability of surfactants to assist in the removal of image scum in positive resist development
Author: Belden, Michael P.
Abstract: An experiment was run to determine the ability of surfactants to reduce or remove scum produced during development of a positive resist. Anionic, cationic and nonionic surfactants were added to a low metal ion developer at concentrations between 0.025% and 0.57o. The film thickness loss due to development was measured, and image profiles were observed with scanning electron micrographs . Of the surfactants tried, Aerasol OT-75 (dioctyl ester of sodium sulfosuccinic acid) produced the best results, 9.57o film thickness loss with little image profile change. However, the experiment was limited by processing condition variables.
Record URI: http://hdl.handle.net/1850/9893
Date: 1982-05

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