The effects of agitation in positive photoresist image quality when using a bubble development system

Show full item record

Title: The effects of agitation in positive photoresist image quality when using a bubble development system
Author: Mogerley, Keith D.
Abstract: An important goal of the microelectronics industry is to make new technological advances while keeping the cost of the fabrication process down. To achieve this goal, the microelectronics industry are presently placing more active devices on each chip, while at the same time trying to increase the number of successful chips per wafer. In order for the industry to successfully do this, they must reduce all of the dimensions in the circuit while trying to maintain its physical, chemical, and functional properties. These demands have made all steps of the fabrication process more critical. The scope of this project will encompass the development of exposed positive photoresist with an emphasis placed upon the effects of agitation on resist image quality.
Record URI: http://hdl.handle.net/1850/9902
Date: 1983-04-15

Files in this item

Files Size Format View
KMogerleyThesis4-15-1983.pdf 2.748Mb PDF View/Open

The following license files are associated with this item:

This item appears in the following Collection(s)

Show full item record

Search RIT DML


Advanced Search

Browse