Tantalum oxide thin films for microelectronic applications

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dc.contributor.author Jiang, Fang-Xing
dc.contributor.author Kurinec, Santosh
dc.date.accessioned 2009-06-25T19:45:47Z
dc.date.available 2009-06-25T19:45:47Z
dc.date.issued 1995-05
dc.identifier.uri http://hdl.handle.net/1850/9955
dc.description Copyright 1995 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. en_US
dc.description.abstract Over the last several years, tantalum pentoxide (Ta2O5) thin films have received much attention as chip integrated high permittivity, high breakdown strength dielectrics for storage capacitors for ULSI DRAMs. We have studied the properties of reactively sputtered films of Ta2O5 on silicon wafers. These films have been characterized for refractive index. X-ray diffraction studies on films annealed in oxygen ambient at 800°C show the films to crystallize into an orthorhombic phase with an increase in refractive index with respect to the bulk value. Various capacitor configurations such as MIM, MIS (on p-type and n-type Si substrates) have been fabricated to study the nature of the Ta2O5/Si interface. The capacitors fabricated on p-type Si exhibit lower leakage. The reactive ion etching behavior of Ta2O5 is investigated in CF4+O2 and CHF3. It is observed that these films show lower etch rate as compared to Si and SiO2, however in CHF3 the etch rates of Si and Ta2O5 are comparable. en_US
dc.language.iso en_US en_US
dc.publisher IEEE en_US
dc.relation RIT Scholars content from RIT Digital Media Library has moved from http://ritdml.rit.edu/handle/1850/9955 to RIT Scholar Works http://scholarworks.rit.edu/article/1025, please update your feeds & links!
dc.subject Dielectric thin films en_US
dc.subject Refractive index en_US
dc.subject Sputtered coatings en_US
dc.subject Sputter etching en_US
dc.subject Tantalum compounds en_US
dc.subject Thin film capacitors en_US
dc.subject X-ray diffraction en_US
dc.title Tantalum oxide thin films for microelectronic applications en_US
dc.type Article en_US

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