Development of a linear source, atmospheric-pressure, non-thermal RF glow discharge plasma for surface treatment, etchin, and thin film deposition

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Title: Development of a linear source, atmospheric-pressure, non-thermal RF glow discharge plasma for surface treatment, etchin, and thin film deposition
Author: Wagner, Andrew; Whiting, P.; Mariotti, Davide
Description: 8th Annual IEEE Student Design Contest, 3 May 2008, Rochester (NY), USA. Held by the Rochester Institute of Technology (RIT) Institute of Electrical and Electronics Engineers (IEEE) student chapter.
Record URI: http://hdl.handle.net/1850/9992
Date: 2008-05-03

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